Experimental study on a new sterilization process using plasma source ion implantation with N2 gas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 4, 2003, Pages 1230-1236

  Yoshida, M ^a   Tanaka, T ^b   Watanabe, S ^b   Takagi, T ^b   Shinohara, M ^c   Fujii, S ^d  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^b HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

^c Kurita Seisakusho Co Ltd   (Japan)

^d ADTEC Plasma Technology Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BACTERIA; BIOLOGICAL MATERIALS; DNA; GLOW DISCHARGES; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; ION IMPLANTATION; NITROGEN; SCANNING ELECTRON MICROSCOPY; STERILIZATION (CLEANING);

HIGH ENERGY ELECTRON BEAMS; PLASMA SOURCE ION IMPLANTATION; STAINLESS ELECTRODE;

PLASMA SOURCES;

EID: 0042531544     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1562183     Document Type: Article

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