Rate analysis of chemical vapor deposition by use of the thin tubular reactor

Thin Solid Films

Volumn 498, Issue 1-2, 2006, Pages 25-29

  Kawase, Motoaki ^a   Miura, Kouichi ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Ethylene; Pyrolytic carbon; Rate analysis; Thin tubular reactor

Indexed keywords

CHEMICAL REACTORS; ETHYLENE; GROWTH (MATERIALS); ISOTHERMS; MASS TRANSFER; PRESSURE EFFECTS; RATE CONSTANTS;

PYROLYTIC CARBON; RATE ANALYSIS; THIN TUBULAR REACTOR; VOLUME-TO-SURFACE RATIO;

CHEMICAL VAPOR DEPOSITION;

EID: 30944468127     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.057     Document Type: Conference Paper

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