Growth Kinetics of Chemical Vapor Deposition of Al2O3

Kagaku Kogaku Ronbunshu

Volumn 24, Issue 1, 1998, Pages 81-85

  Tago, Teruoki ^a   Kawase, Motoaki ^a   Masaki, Yoshinori ^a   Hashimoto, Kenji ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

alumina thin film; aluminum triisopropoxide; chemical vapor deposition; growth kinetics; reaction path

Indexed keywords

EID: 21944454104     PISSN: 0386216X     EISSN: 13499203     Source Type: Journal    
DOI: 10.1252/kakoronbunshu.24.81     Document Type: Article

References (11)

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