SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 498, Issue 1-2, 2006, Pages 230-234

Chemical vapor deposition of uniform and high-quality diamond films by bias-enhanced nucleation method

(2) Yan, Jhih Kun a Chang, Li a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

Chemical vapor deposition; Diamond; Growth; Nucleation

Indexed keywords

CRYSTALLINE MATERIALS; DENSITY CONTROL (SPECIFIC GRAVITY); MORPHOLOGY; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY;

DIAMOND CRYSTALLITES; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MWCVD); MO ANODE; SURFACE AREA;

DIAMOND FILMS;

EID: 30944443050 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.07.097 Document Type: Conference Paper

Times cited : (11)

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