Facility for extreme ultraviolet reflectometry of lithography optics

Metrologia

Volumn 40, Issue 1 SPEC., 2003, Pages

  Tarrio, C ^a   Grantham, S ^a   Lucatorto, T B ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MONOCHROMATORS; MULTILAYERS; OPTICAL COATINGS; OPTICS; REFLECTOMETERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET REFLECTOMETRY; LITHOGRAPHY OPTICS; MULTILAYER COATINGS;

LITHOGRAPHY;

EID: 0037226076     PISSN: 00261394     EISSN: None     Source Type: Journal    
DOI: 10.1088/0026-1394/40/1/003     Document Type: Article

References (6)

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3. Tichenor D A et al 2001 Initial results from the EUV engineering test stand Soft X-ray and EUV Imaging Systems II: Proc. SPIE vol 4506, ed J A Folta and D A Tichenor, pp 9-18
4. Gullikson E M, Mrowka S and Kaurmann B B 2001 Recent developments in EUV reflectometry at the advanced light source Proc. SPIE 4343 363-73
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