Growth kinetics and silicon diffusivity in MoSi2 and WSi 2 disilicides

Defect and Diffusion Forum

Volumn 237-240, Issue PART 2, 2005, Pages 867-872

  Chatilyan, Hakob A ^a   Arakelyan, Lilit H ^b   Kharatyan, Suren L ^a,b  

^a Institute of Chemical Physics National Academy of Sciences of the Republic of Armenia   (Armenia)

^b YEREVAN STATE UNIVERSITY   (Armenia)

Author keywords

Diffusivity; Disilicide; Kinetics; Molybdenum; Parabolic rate constant; Silane; Tungsten

Indexed keywords

DIFFUSION; MOLYBDENUM COMPOUNDS; SILANES; SILICON; TEMPERATURE DISTRIBUTION; TUNGSTEN COMPOUNDS;

DIFFUSIVITY; DISILICIDE; KINETICS;

GROWTH KINETICS;

EID: 30744453219     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.237-240.867     Document Type: Conference Paper

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