Growth rate constant and chemical diffusivity in silicides Mo5Si3 and Ta5Si3

Materials Transactions, JIM

Volumn 39, Issue 2, 1998, Pages 286-291

  Christian, Francis ^a   Sohma, Hideaki ^b   Tanaka, Toshiaki ^b   Tanaka, Hiroyuki ^c   Ohsasa, Ken Ichi ^a   Narita, Toshio ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

^b Muroran Techno Center Foundation   (Japan)

^c HOKKAIDO INDUSTRIAL RESEARCH INSTITUTE   (Japan)

Author keywords

Chemical diffusion coefficient; Intermetallic silicides; Kirkendall effect; Molybdenum silicide; Parabolic growth; Tantalum silicide

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; DIFFUSION IN SOLIDS; MICROANALYSIS; MOLYBDENUM ALLOYS; MULTILAYERS; SUBSTRATES; TANTALUM ALLOYS;

CHEMICAL DIFFUSION COEFFICIENTS; ELECTRON PROBE MICROANALYSIS; KIRKENDALL EFFECT; WAGNER'S EQUATION;

INTERMETALLICS;

EID: 0031998849     PISSN: 09161821     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.39.286     Document Type: Article

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