TEM and IBA study of the thermal oxidation of V following high dose He implantation

Journal of Nuclear Materials

Volumn 244, Issue 1, 1997, Pages 51-58

  Gilberd, P W ^a   Johnson, P B ^a   Vickridge, I C ^b   Wismayer, A C ^c  

^a VICTORIA UNIVERSITY OF WELLINGTON   (New Zealand)

^b GNS SCIENCE   (New Zealand)

^c Open Polytechnic of New Zealand   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; ION IMPLANTATION; OXYGEN; TRANSMISSION ELECTRON MICROSCOPY; VOLUME FRACTION;

BUBBLE ARRAYS; BUBBLE STRUCTURE; ION BEAM ANALYSIS; OXIDE LAYER; THERMAL OXIDATION;

VANADIUM;

EID: 0031101955     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(96)00726-X     Document Type: Article

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