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1
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3042844902
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Surface/bulk micromachined high performance silicon microgyroscope
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Hilton Head Island, SC, USA, June
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D. Cho, S. Lee, and S. Park, "Surface/Bulk Micromachined High Performance Silicon Microgyroscope," Hilton Head 2000, Late News, Hilton Head Island, SC, USA, June 2000.
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(2000)
Hilton Head 2000, Late News
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Cho, D.1
Lee, S.2
Park, S.3
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2
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0034468093
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Surface/bulk micromachined single-crystalline silicon micro-gyroscope
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Dec.
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S. Lee, S. Park, J. Kim, S. Yi, and D. Cho, "Surface/Bulk Micromachined Single-crystalline Silicon Micro-gyroscope," IEEE/ASME JMEMS, vol. 9, no. 4, pp. 557-567, Dec. 2000.
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(2000)
IEEE/ASME JMEMS
, vol.9
, Issue.4
, pp. 557-567
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Lee, S.1
Park, S.2
Kim, J.3
Yi, S.4
Cho, D.5
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3
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84944739646
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Robust SOI process without footing for ultra high-performance microgyroscopes
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Boston, USA, June 8-12
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J. Kim, S. Park, D. Kwak, H. Ko, W. Carr, J. Buss, and D. Cho, "Robust SOI Process without Footing for Ultra High-Performance Microgyroscopes," Proc. of Transducers 2003, pp. 1691-1694, Boston, USA, June 8-12, 2003.
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(2003)
Proc. of Transducers 2003
, pp. 1691-1694
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Kim, J.1
Park, S.2
Kwak, D.3
Ko, H.4
Carr, W.5
Buss, J.6
Cho, D.7
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4
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0032666301
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A micromachined vibrating rate gyroscope with independent beams for the drive and detection modes
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Orlando, USA, January 17-21
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Y. Mochida, M. Tamura, and K. Ohwada, "A micromachined vibrating rate gyroscope with independent beams for the drive and detection modes," MEMS'99, Orlando, USA, January 17-21, 1999, pp. 618-623.
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(1999)
MEMS'99
, pp. 618-623
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Mochida, Y.1
Tamura, M.2
Ohwada, K.3
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5
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0034869180
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A de-coupled vibratory gyroscope using a mixed micro-machining technology
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Seoul, Korea, May 21-26
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B. Lee, S. Lee, K. Jung. J. Choi, T. Chung, and Y. Cho, "A de-coupled vibratory gyroscope using a mixed micro-machining technology," Proc. of ICRA, Seoul, Korea, May 21-26, 2001, pp.3412-3416.
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(2001)
Proc. of ICRA
, pp. 3412-3416
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Lee, B.1
Lee, S.2
Jung, K.3
Choi, J.4
Chung, T.5
Cho, Y.6
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6
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0010356623
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A new micromachining technology using (111) silicon
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Kyungju, Korea, June
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S. Lee, S. Park, and D. Cho, "A New Micromachining Technology Using (111) Silicon," Proc. of MNC, pp. 174-175, Kyungju, Korea, June 1998.
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(1998)
Proc. of MNC
, pp. 174-175
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Lee, S.1
Park, S.2
Cho, D.3
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7
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0032633034
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A new micromachining technique with (111) silicon
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May
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S. Lee, S. Park, and D. Cho, "A New Micromachining Technique with (111) Silicon," Japanese Journal of Applied Physics, vol. 38, pp. 2699-2703, May 1999.
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(1999)
Japanese Journal of Applied Physics
, vol.38
, pp. 2699-2703
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Lee, S.1
Park, S.2
Cho, D.3
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8
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0033352311
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The surface/bulk micromachining (SBM) process: A new method for fabricating released microelectromechanical systems in single crystal silicon
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Dec.
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S. Lee, S. Park, and D. Cho, "The Surface/Bulk Micromachining (SBM) Process: A New Method for Fabricating Released Microelectromechanical Systems in Single Crystal Silicon," IEEE/ASME JMEMS, vol. 8, no. 4, pp. 409-416, Dec. 1999.
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(1999)
IEEE/ASME JMEMS
, vol.8
, Issue.4
, pp. 409-416
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Lee, S.1
Park, S.2
Cho, D.3
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9
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0010952382
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A novel electrostatic vertical actuator fabricated in one homogeneous silicon wafer using extended SBM technology
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Munich, Germany, June
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J. Kim, S. Park, and D. Cho,., "A Novel Electrostatic Vertical Actuator Fabricated in One Homogeneous Silicon Wafer Using Extended SBM Technology," Proc. of Transducers 2001, pp. 756-759, Munich, Germany, June 2001.
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(2001)
Proc. of Transducers 2001
, pp. 756-759
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Kim, J.1
Park, S.2
Cho, D.3
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10
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18544391592
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A novel electrostatic vertical actuator fabricated in one homogeneous silicon wafer using extended SBM technology
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April
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J. Kim, S. Park, and D. Cho, "A Novel Electrostatic Vertical Actuator Fabricated in One Homogeneous Silicon Wafer Using Extended SBM Technology", Sensors and Actuators A, vol. 97-98, pp. 653-658, April 2002.
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(2002)
Sensors and Actuators A
, vol.97-98
, pp. 653-658
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Kim, J.1
Park, S.2
Cho, D.3
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11
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3042727677
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A flat high-frequency scanning micromirror
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Hilton Head Island, SC, USA, June 4-8
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R. A. Conant, J. T. Nee, K. Y. Lau, and R. S. Muller, "A flat high-frequency scanning micromirror," Hilton Head 2000, Hilton Head Island, SC, USA, June 4-8, 2000, pp. 6-13.
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(2000)
Hilton Head 2000
, pp. 6-13
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Conant, R.A.1
Nee, J.T.2
Lau, K.Y.3
Muller, R.S.4
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12
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0036897253
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SOI-based fabrication, processes of the scanning mirror having vertical comb fingers
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December
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J. Lee, Y. Ko, H. Jeong, B. Choi, J. Kim, and D. Jeon, "SOI-based fabrication, processes of the scanning mirror having vertical comb fingers," Sensors and Actuators A, Vol. 102, pp. 11-18, December 2002.
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(2002)
Sensors and Actuators A
, vol.102
, pp. 11-18
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Lee, J.1
Ko, Y.2
Jeong, H.3
Choi, B.4
Kim, J.5
Jeon, D.6
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13
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0036544176
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Honeycomb-shaped deep-trench oxide posts combined with the SBM technology for micromachining single crystal silicon without using SOI
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April
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S. Lee, S. Park, and D. Cho, "Honeycomb-shaped Deep-trench Oxide Posts Combined with the SBM Technology for Micromachining Single Crystal Silicon without Using SOI," Sensors and Actuators A, vol. 97-98, pp. 734-738, April 2002.
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(2002)
Sensors and Actuators A
, vol.97-98
, pp. 734-738
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Lee, S.1
Park, S.2
Cho, D.3
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14
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0010401084
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Honeycomb-shaped deep-trench oxide posts combined with the SBM technology for micromachining single-crystal silicon without using SOI
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Munich, Germany, June
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S. Lee, S. Park, and D. Cho, "Honeycomb-shaped Deep-trench Oxide Posts Combined with the SBM Technology for Micromachining Single-crystal Silicon without Using SOI," Proc. of Transducers 2001, pp. 1124-1127, Munich, Germany, June 2001.
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(2001)
Proc. of Transducers 2001
, pp. 1124-1127
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Lee, S.1
Park, S.2
Cho, D.3
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15
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3042727680
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A new isolation method for single-crystalline silicon MEMS using localized SOI structure
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Seoul, Apr.
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S. Park, S. Kim, J. Kim, S. Lee, S. Paik, C. Koo, and D. Cho, "A New Isolation Method for Single-crystalline Silicon MEMS Using Localized SOI Structure," Proc. of the 3rd Korean MEMS Conference, pp. 129-135, Seoul, Apr. 2001.
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(2001)
Proc. of the 3rd Korean MEMS Conference
, pp. 129-135
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Park, S.1
Kim, S.2
Kim, J.3
Lee, S.4
Paik, S.5
Koo, C.6
Cho, D.7
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16
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3042727679
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IEDM, Washington D.C., USA, Dec.
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S. Park, J. Kim, D. Kwak, H. Ko, D. Cho, W. Carr, and J. Buss, "A New Isolation Method for Single Crystal Silicon MEMS and Its Application to z-axis Microgyroscope," IEDM, Washington D.C., USA, Dec. 2003.
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(2003)
A New Isolation Method for Single Crystal Silicon MEMS and Its Application to Z-axis Microgyroscope
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Park, S.1
Kim, J.2
Kwak, D.3
Ko, H.4
Cho, D.5
Carr, W.6
Buss, J.7
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