Surface polishing of three dimensional micro structures

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 709-712

  Lim, C H ^a   Kim, W B ^a   Lee, S H ^a   Lee, J I ^a   Kim, Y J ^a   Lee, S J ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROPLATING; MAGNETIC FIELDS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSTRUCTURE; REACTIVE ION ETCHING; RHEOLOGY; SURFACE ROUGHNESS; YIELD STRESS;

CHEMICAL MECHANICAL POLISHING (CMP); HYDRODYNAMIC PRESSURE; MAGNETORHEOLOGICAL (MR) FLUID; SCANNING INTERFEROMETER;

CHEMICAL POLISHING;

EID: 3042784593     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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