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Volumn 2, Issue 3, 2003, Pages 121-125

Threshold voltage calculation in ultrathin-film SOI MOSFETs using the effective potential

Author keywords

Monte Carlo methods; MOSFETs; Quantum theory; Semiconductor insulator interfaces; Silicon on insulator (SOI) technology

Indexed keywords

COMPUTER SIMULATION; DOPING (ADDITIVES); MONTE CARLO METHODS; POISSON EQUATION; QUANTUM THEORY; SILICON; SILICON ON INSULATOR TECHNOLOGY; ULTRATHIN FILMS; VOLTAGE MEASUREMENT;

EID: 3042742893     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2003.817224     Document Type: Article
Times cited : (9)

References (8)
  • 1
    • 0029535575 scopus 로고
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    • Dec.
    • S. Takagi and A. Toriumi, "Quantitative understanding of inversion-layer capacitance in Si MOSFETs," IEEE Trans. Electron Devices, vol. 42, pp. 2125-2130, Dec. 1995.
    • (1995) IEEE Trans. Electron Devices , vol.42 , pp. 2125-2130
    • Takagi, S.1    Toriumi, A.2
  • 2
    • 84954137737 scopus 로고
    • Quantum-mechanical threshold voltage shifts of MOSFETs caused by high levels of channel doping
    • M. J. van Dort, P. H. Woerlee, A. J. Walker, C. A. H. Juffermans, and H. Lifka, "Quantum-mechanical threshold voltage shifts of MOSFETs caused by high levels of channel doping," in IEDM Tech. Dig., 1991, pp. 495-498.
    • (1991) IEDM Tech. Dig. , pp. 495-498
    • Van Dort, M.J.1    Woerlee, P.H.2    Walker, A.J.3    Juffermans, C.A.H.4    Lifka, H.5
  • 3
    • 0031145794 scopus 로고    scopus 로고
    • 50 nm channel nMOSFET/SIMOX with an ultranthin 2 or 6 nm thick silicon layer and their significant features of operations
    • May
    • Y. Omura, K. Kurihara, Y. Takahashi, T. Ishiyama, Y. Nakajima, and K. Izumi, "50 nm channel nMOSFET/SIMOX with an ultranthin 2 or 6 nm thick silicon layer and their significant features of operations," IEEE Electron Device Lett., vol. 18, pp. 190-193, May 1997.
    • (1997) IEEE Electron Device Lett. , vol.18 , pp. 190-193
    • Omura, Y.1    Kurihara, K.2    Takahashi, Y.3    Ishiyama, T.4    Nakajima, Y.5    Izumi, K.6
  • 4
    • 0034453530 scopus 로고    scopus 로고
    • Quantum effects in MOSFETs: Use of an effective potential in 3D Monte Carlo simulation of ultra-short channel devices
    • D. K. Ferry, R. Akis, and D. Vasileska, "Quantum effects in MOSFETs: use of an effective potential in 3D Monte Carlo simulation of ultra-short channel devices," in IEDM Tech. Dig., 2000, pp. 287-291.
    • (2000) IEDM Tech. Dig. , pp. 287-291
    • Ferry, D.K.1    Akis, R.2    Vasileska, D.3
  • 5
    • 0036503414 scopus 로고    scopus 로고
    • Modeling of quantum effects in ultrasmall FD-SOI MOSFETs with effective potentials and 3D Monte Carlo
    • Mar.
    • S. M. Ramey and D. K. Ferry, "Modeling of quantum effects in ultrasmall FD-SOI MOSFETs with effective potentials and 3D Monte Carlo," Phys. B: Condens. Matter, vol. 314, pp. 350-353, Mar. 2002.
    • (2002) Phys. B: Condens. Matter , vol.314 , pp. 350-353
    • Ramey, S.M.1    Ferry, D.K.2
  • 7
    • 0034316565 scopus 로고    scopus 로고
    • Effective potentials and the onset of quantization in ultra-small MOSFETs
    • D. K. Ferry, "Effective potentials and the onset of quantization in ultra-small MOSFETs," Superlattices Microstructures, vol. 28, no. 5/6, pp. 419-423, 2000.
    • (2000) Superlattices Microstructures , vol.28 , Issue.5-6 , pp. 419-423
    • Ferry, D.K.1
  • 8
    • 0027886706 scopus 로고
    • Quantum-Mechanical effects on the threshold voltage of ultrathin SOI nMOSFETs
    • Dec.
    • Y. Omura, S. Horiguchi, M. Tabe, and K. Kishi, "Quantum-Mechanical effects on the threshold voltage of ultrathin SOI nMOSFETs," IEEE Electron Device Lett., vol. 14, pp. 569-569, Dec. 1993.
    • (1993) IEEE Electron Device Lett. , vol.14 , pp. 569-569
    • Omura, Y.1    Horiguchi, S.2    Tabe, M.3    Kishi, K.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.