Application of a new Cl-plasma-treated Ag/AgCl reference electrode to micromachined glucose sensor

IEEE Sensors Journal

Volumn 3, Issue 3, 2003, Pages 267-273

  Park, Se Ik ^a   Jun, Sang Beom ^a   Park, Sejin ^b   Kim, Hee Chan ^b   Kim, Sung June ^a  

^a Seoul National University   (South Korea)

^b Seoul National University   (South Korea)

Author keywords

Mass production; Micromachined glucose sensor; Monolithic integration; Plasma treated Ag AgCl reference electrode; Potential drift

Indexed keywords

CHLORINATION; CMOS INTEGRATED CIRCUITS; COMPUTATIONAL METHODS; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; ENZYMES; GLUCOSE SENSORS; MASS TRANSFER; MICROMACHINING; PLASMAS; PROBLEM SOLVING; SIGNAL PROCESSING; SILICON WAFERS; SILVER; SILVER COMPOUNDS;

MASS PRODUCTION; MICROMACHINED GLUCOSE SENSOR; MONOLITHIC INTEGRATION; PLASMA-TREATED AG/AGCL REFERENCE ELECTRODE; POTENTIAL DRIFT;

AMPEROMETRIC SENSORS;

EID: 3042739491     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2003.814649     Document Type: Article

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