Characterization of microelectrode arrays by means of electrochemical and surface analysis methods

Sensors and Actuators, B: Chemical

Volumn 40, Issue 1, 1997, Pages 79-84

  Wittkampf, Michael ^a   Cammann, Karl ^a   Amrein, Matthias ^a   Reichelt, Rudolf ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Electrochemical characterization; Microelectrode arrays; Modified CMOS process; Silicon thin film technology; Surface analysis

Indexed keywords

CYCLIC VOLTAMMETRY; MOS DEVICES; PLATINUM; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SURFACE STRUCTURE; THIN FILMS;

METAL OXIDE SEMICONDUCTOR TECHNOLOGY; MICROELECTRODE ARRAYS;

MICROELECTRODES;

EID: 0031130419     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)80200-6     Document Type: Article

References (11)

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