SCOPUS 정보 검색 플랫폼

Electrochemical and Solid-State Letters

Volumn 7, Issue 7, 2004, Pages

Low-temperature poly-si thin-film transistor with a N2O-plasma ONO multilayer gate dielectric

(3) Chang, Kow Ming a Yang, Wen Chih a Hung, Bing Fang a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; DYNAMIC RANDOM ACCESS STORAGE; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRODES; LEAKAGE CURRENTS; PERMITTIVITY; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SECONDARY ION MASS SPECTROMETRY; SILICA; THYRISTORS;

GATE DIELECTRIC FILMS; PLASMA PASSIVATION; VACUUM CONTAINER; WET ETCHING;

THIN FILM TRANSISTORS;

EID: 3042717847 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1753253 Document Type: Article

Times cited : (6)

References (12)

1
- 0036638433
- K. C. Moon, J.-H. Lee, and M.-K. Han, IEEE Trans. Electron Devices, 49, 1319 (2002).
- (2002) IEEE Trans. Electron Devices , vol.49 , pp. 1319
- Moon, K.C.¹ Lee, J.-H.² Han, M.-K.³

2
- 2942659294
- D. H. Choi, E. Sadayuki, O. Sugiura, and M. Matsumura, IEEE Trans. Electron Devices, 40, 2129 (1993).
- (1993) IEEE Trans. Electron Devices , vol.40 , pp. 2129
- Choi, D.H.¹ Sadayuki, E.² Sugiura, O.³ Matsumura, M.⁴

3
- 84914025888
- Y. Ikeda, K. Kishimoto, K. Hirose, and Y. Numasawa, Tech. Dig. - Int. Electron Devices Meet., 1992, 289.
- Tech. Dig. - Int. Electron Devices Meet. , vol.1992 , pp. 289
- Ikeda, Y.¹ Kishimoto, K.² Hirose, K.³ Numasawa, Y.⁴

4
- 0030358958
- S. Lim, S. I. Kim, J. H. Jung, B. K. Ju, M. H. Oh, and J. F. Wager, in 9th International Vacuum Microelectronics Conference, IVMC'96, p. 406 (1996).
- (1996) 9th International Vacuum Microelectronics Conference, IVMC' , vol.96 , pp. 406
- Lim, S.¹ Kim, S.I.² Jung, J.H.³ Ju, B.K.⁴ Oh, M.H.⁵ Wager, J.F.⁶

5
- 0021640182
- T. Watanabe, A. Menjoh, M. Ishikawa, and J. Kumagai, in Proceedings of the International Electron Device Meeting, p. 173 (1984).
- (1984) Proceedings of the International Electron Device Meeting , pp. 173
- Watanabe, T.¹ Menjoh, A.² Ishikawa, M.³ Kumagai, J.⁴

6
- 0029324017
- C. K. Yang, C. L. Lee, and T. F. Lei, IEEE Electron Device Lett., 16, 228 (1995).
- (1995) IEEE Electron Device Lett. , vol.16 , pp. 228
- Yang, C.K.¹ Lee, C.L.² Lei, T.F.³

7
- 0010284202
- W. Ting, S. N. Lin, and D. L. Kwong, Appl. Phys. Lett., 55, 2313 (1989).
- (1989) Appl. Phys. Lett. , vol.55 , pp. 2313
- Ting, W.¹ Lin, S.N.² Kwong, D.L.³

8
- 26544448002
- N. Ibaraki, T. Shimano, K. Fukuda, and K. Matsumura, Tech. Dig. - Int. Electron Devices Meet., 1990, 97.
- Tech. Dig. - Int. Electron Devices Meet. , vol.1990 , pp. 97
- Ibaraki, N.¹ Shimano, T.² Fukuda, K.³ Matsumura, K.⁴

9
- 0032595865
- E. Ibok, K. Ahmed, M.-Y. Hao, B. Ogle, I. J. Wortman, and J. R. Hauser, IEEE Electron Device Lett., 20, 442 (1999).
- (1999) IEEE Electron Device Lett. , vol.20 , pp. 442
- Ibok, E.¹ Ahmed, K.² Hao, M.-Y.³ Ogle, B.⁴ Wortman, I.J.⁵ Hauser, J.R.⁶

10
- 3042846665
- J. W. Lee, N. I. Lee, S. H. Hur, and C. H. Han, J. Electrochem. Soc., 144, 3228 (1997).
- (1997) J. Electrochem. Soc. , vol.144 , pp. 3228
- Lee, J.W.¹ Lee, N.I.² Hur, S.H.³ Han, C.H.⁴

11
- 0004005306
- John Wiley & Sons, New York
- S. M. Sze, Physics of Semiconductor Devices, 2nd ed. John Wiley & Sons, New York (1985).
- Physics of Semiconductor Devices, 2nd Ed. , pp. 1985
- Sze, S.M.¹

12
- 0034510714
- S. Han and H. Shin, in 5th International Symposium on IEEE Plasma Process-Induced Damage, p. 133 (2000).
- (2000) 5th International Symposium on IEEE Plasma Process-induced Damage , pp. 133
- Han, S.¹ Shin, H.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.