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Volumn 35, Issue 7, 2004, Pages 543-547

The effect of beam diameter on the electron skirt in a high pressure scanning electron microscope

Author keywords

Electron profile; Electron scattering; High pressure scanning electron microscope; Monte Carlo; Skirting

Indexed keywords


EID: 3042644469     PISSN: 09684328     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micron.2004.03.003     Document Type: Article
Times cited : (6)

References (12)
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    • Adamiak, B.1    Mathieu, C.2
  • 2
    • 33947711876 scopus 로고
    • Foundations of environmental scanning electron microscopy
    • Danilatos G.D. Foundations of environmental scanning electron microscopy. Adv. Electron. Electron Phys. 71:1988;109-250
    • (1988) Adv. Electron. Electron Phys. , vol.71 , pp. 109-250
    • Danilatos, G.D.1
  • 3
    • 0025652446 scopus 로고
    • Equation of charge distribution in the ESEM
    • Danilatos G.D. Equation of charge distribution in the ESEM. Scanning Microsc. 4:1990;799-823
    • (1990) Scanning Microsc. , vol.4 , pp. 799-823
    • Danilatos, G.D.1
  • 4
    • 0000480051 scopus 로고
    • Environmental scanning electron microscopy and microanalysis
    • Danilatos G.D. Environmental scanning electron microscopy and microanalysis. Mikrochim. Acta. 114/115:1990;143-155
    • (1990) Mikrochim. Acta , vol.114-115 , pp. 143-155
    • Danilatos, G.D.1
  • 5
    • 0030159407 scopus 로고    scopus 로고
    • Low voltage scanning electron microscopy
    • Joy C.D., Joy S.C. Low voltage scanning electron microscopy. Micron. 27:1996;247-263
    • (1996) Micron , vol.27 , pp. 247-263
    • Joy, C.D.1    Joy, S.C.2
  • 6
    • 0038205908 scopus 로고    scopus 로고
    • Computation and experiments on the beam spread in the VP-SEM: Application to X-ray microanalysis
    • Kadoun A., Belkorissat R., Khelifa B., Mathieu C. Computation and experiments on the beam spread in the VP-SEM: application to X-ray microanalysis. J. Trace Microprobe Tech. 21:2003;229-238
    • (2003) J. Trace Microprobe Tech. , vol.21 , pp. 229-238
    • Kadoun, A.1    Belkorissat, R.2    Khelifa, B.3    Mathieu, C.4
  • 7
    • 0037462246 scopus 로고    scopus 로고
    • Comparative study of electron beam-gas interaction in a SEM operating at pressure up to 300 Pa
    • Kadoun A., Belkorissat R., Khelifa B., Mathieu C. Comparative study of electron beam-gas interaction in a SEM operating at pressure up to 300 Pa. Vacuum. 69:2003;537-544
    • (2003) Vacuum , vol.69 , pp. 537-544
    • Kadoun, A.1    Belkorissat, R.2    Khelifa, B.3    Mathieu, C.4
  • 8
    • 0006340153 scopus 로고    scopus 로고
    • B} Effects of electron-beam/gas interactions on X-ray microanalysis in the variable pressure SEM
    • Mathieu C. b} Effects of electron-beam/gas interactions on X-ray microanalysis in the variable pressure SEM. Microchim. Acta (suppl). 15:1998;295-300
    • (1998) Microchim. Acta (Suppl) , vol.15 , pp. 295-300
    • Mathieu, C.1
  • 10
    • 0034472758 scopus 로고    scopus 로고
    • Image quality improvement using helium gas in low voltage variable pressure scanning electron microscopy
    • Oho E., Akai A., Itoh S. Image quality improvement using helium gas in low voltage variable pressure scanning electron microscopy. J. Electron Microsc. 49:(6):2000;761-763
    • (2000) J. Electron Microsc. , vol.49 , Issue.6 , pp. 761-763
    • Oho, E.1    Akai, A.2    Itoh, S.3
  • 12
    • 0037151218 scopus 로고    scopus 로고
    • Quantification of electron-ion recombination in an electron-beam- irradiated gas capacitor
    • Toth M., Daniels D.R., Thiel B.L., Donald A.M. Quantification of electron-ion recombination in an electron-beam-irradiated gas capacitor. J. Phys. D: Appl. Phys. 35:2002;1796-1804
    • (2002) J. Phys. D: Appl. Phys. , vol.35 , pp. 1796-1804
    • Toth, M.1    Daniels, D.R.2    Thiel, B.L.3    Donald, A.M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.