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Volumn 108, Issue 23, 2004, Pages 7597-7602

Fluorination induced etching selectivity of boron nitride phases

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL METHODS; DIAMONDS; ELECTRONIC STRUCTURE; ETCHING; FLUORINE COMPOUNDS; HYDROGEN; METALLIC FILMS; NITRIDES; SYNTHESIS (CHEMICAL);

EID: 3042545754     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp037875v     Document Type: Article
Times cited : (9)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.