Residual stress properties of polysilicon thin film

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 20, Issue 6, 1999, Pages 463-467

  Zhang, Guobing ^a   Hao, Yilong ^a   Tian, Dayu ^a   Liu, Shimei ^a   Wang, Tiesong ^a   Wu, Guoying ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

RESIDUAL STRESSES; THIN FILMS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; POLYSILICON THIN FILM;

SILICON;

EID: 0033140743     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)