Characterization and reliability of TaN thin film resistors

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 2004, Pages 502-508

  Lee, Tom ^a   Watson, Kim ^a   Chen, Fen ^a   Gill, Jason ^a   Harmon, David ^a   Sullivan, Tim ^a   Li, Baozhen ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACK END OF THE LINE (BEOL); FRONT END OF THE LINE (FEOL); TEMPERATURE COEFFICIENT OF RESISTANCE (TCR); TEMPERATURE RISE VERSUS INPUT POWER (TVP);

CMOS INTEGRATED CIRCUITS; DEPOSITION; HEAT RESISTANCE; MATHEMATICAL INSTRUMENTS; RELIABILITY; TANTALUM COMPOUNDS; THIN FILMS; VOLTAGE MEASUREMENT;

RESISTORS;

EID: 3042522549     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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