Mechanistic feature-scale profile simulation of SiO2 low-pressure chemical vapor deposition by tetraethoxysilane pyrolysis

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 267-278

  Labun, Andrew H ^a   Moffat, Harry K ^b   Cale, Timothy S ^c  

^a HEWLETT PACKARD COMPANY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; PYROLYSIS; REACTION KINETICS; SILICA; THIN FILMS;

SOFTWARE PACKAGE EVOLVE; TETRAETHOXYSILANE;

SILANES;

EID: 0033725631     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591182     Document Type: Article

References (19)

1. Juan C. Key, Junling Li, Victor Boksha, D. Adalsteinsson, and J. A. Sethian, Solid State Technol. 41, 77 (1998).
2. EVOLVE is a deposition, etch, and thin film flow simulator, developed under the direction of Timothy S. Cale. Version 5.0b released in November, 1998.
3. R. J. Kee, F. M. Rupley, and J. A. Miller, Sandia National Laboratories Report SAND89-8009B, Sandia National Laboratories, Livermore, CA (1992).
4. M. E. Coltrin, R. J. Kee, and F. M. Rupley, Sandia National Laboratories Report SAND90-8003C, Sandia National Laboratories, Livermore, CA (1994).
5. Licenses available from Reaction Design, 11436 Sorrento Valley Road, San Diego, CA 92121, (619)550-1920, dhk@ReactionDesign.com.
6. R. M. Levin and K. Evans-Lutterodt, J. Vac. Sci. Technol. B 1, 54 (1983).
7. F. S. Becker, D. Pawlik, H. Anzinger, and A. Spitzer, J. Vac. Sci. Technol. B 5, 1555 (1987).
8. G. B. Raupp, F. A. Shemansky, and T. S. Cale, J. Vac. Sci. Technol. B 10, 2422 (1992).
9. T. Sorita, S. Shiga, K. Ikuta, Y. Egashira, and H. Komiyama, J. Electrochem. Soc. 140, 2952 (1993).
10. M. M. IslamRaja, C. Chang, J. P. McVittie, M. A. Cappelli, and K. C. Saraswat, J. Vac. Sci. Technol. B 11, 720 (1993).
11. M. E. Coltrin, P. Ho, H. K. Moffat, and R. J. Buss, Thin Solid Films (submitted).
12. P. Ho and C. F. Melius, J. Phys. Chem. 99, 2166 (1995).
13. E. Meeks, H. K. Moffat, J. F. Grcar, and R. J. Kee, Sandia National Laboratories Report SAND96-8218 (1996).
14. Seshu B. Desu, J. Am. Ceram. Soc. 73, 1615 (1989).
15. J. F. Grcar and W. G. Houf, Sandia National Laboratories Report SAND93-8461 (1993).
16. A. Salinger, K. Devine, G. Hennigan, H. Moffat, S. Hutchinson, and J. Shadid, Sandia National Laboratories Report, SAND96-2331 (1996).
17. R. Walker (private communication).
18. W. H. Press, S. A. Teukolsky, W. T. Vetterling, and B. P. Flannery, Numerical Recipes in C, 2nd ed. (Cambridge, Oxford, 1992), p. 408.
19. P. Ho and M. E. Coltrin (private communication).