Design, fabrication, and characterization of deep-etched waveguide gratings

Journal of Lightwave Technology

Volumn 23, Issue 11, 2005, Pages 3832-3842

  Kleckner, Todd C ^a,b   Modotto, Daniele ^c   Locatelli, Andrea ^c   Mondia, Jessica P ^d   Linden, Stefan ^d   Morandotti, Roberto ^e   De Angelis, Costantino ^c   Stanley, Colin R ^a   van Driel, Henry M ^d   Aitchison, J Stewart ^d  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b Lumerical Solutions Inc   (Canada)

^c UNIVERSITY OF BRESCIA   (Italy)

^d UNIVERSITY OF TORONTO   (Canada)

^e INRS EMT   (Canada)

Author keywords

Defect waveguides; Diffraction; Graftings; Photonic crystals; Reflection; Semiconductor waveguides

Indexed keywords

CHARACTERIZATION; CRYSTALS; ELECTRON BEAM LITHOGRAPHY; LIGHT PROPAGATION; LIGHT REFLECTION; LIGHT TRANSMISSION; OPTICAL DESIGN; OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR GROWTH;

BIDIRECTIONAL BEAM PROPAGATION; DEEP-ETCHED WAVEGUIDE GRATINGS; DEFECT WAVEGUIDES; DIFFRACTION LOSSES; PHOTONIC CRYSTALS; SEMICONDUCTOR WAVEGUIDES;

DIFFRACTION GRATINGS;

EID: 30344442430     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2005.857737     Document Type: Article

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