Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- And chlorine-based reactive-ion etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 1, 1999, Pages 113-117

  Wilkinson, Christopher D W ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24644433968     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

1. Confined Electrons and Photons: New Physics and Applications, edited by E. Burnstein and C. Weisbuch (Plenum, New York, 1995).
2. R. d'Agostino, Plasma Etching: An Introduction, edited by D. M. Manos and D. L. Flamm (Academic, New York, 1989), pp. 167-170.
3. T. F. Krauss, C. J. M. Smith, B. Vögele, S. K. Murad, C. D. W. Wilkinson, R. S. Grant, M. G. Burt, and R. M. De La Rue, Microelectron. Eng. 35, 29 (1997).
4. S. E. Hicks, S. K. Murad, L Sturrock, and C. D. W. Wilkinson, Microelectron. Eng. 35, 41 (1997).
5. A. Charlesby, Atomic Radiation and Polymers (Pergamon, New York, 1960).
6. CRC Handbook of Chemistry and Physics, 73rd ed. (Chemical Rubber, Boca Raton, FL, 1992), pp. 9-131.
7. Y. Hikosaka, H. Toyoda, and H. Sugai, Jpn. J. Appl. Phys., Part 2 32, 690 (1993).
8. A. Grill, Cold Plasmas in Materials Fabrication (IEEE, Piscataway, NJ, 1994), p. 234.
9. Measurements carried out by Loughborough Consultants.
10. S. K. Murad, Thesis, University of Glasgow, 1994.
11. T. Catherine, Diamond and Diamond-like Films and Coatings, edited by R. E. Clausing, L. L. Horton, J. C. Angus, and P. Koidl (Plenum, New York, 1991), p. 193.
12. J. Dulak, B. J. Howard, and C. Steinbruchel, J. Vac. Sci. Technol. A 9, 775 (1991).
13. N. Omori, H. Matsuo, S. Watanabe, and M. Puschmann, Surf. Sci. 352-354, 988 (1996).
14. J. M. Cook and B. W. Benson, J. Electrochem. Soc. 130, 2459 (1983).
15. D. Coquillat, S. K. Murad, A. Ribayrol, C. J. M. Smith, R. M. De La Rue, C. D. W. Wilkinson, O. Briot, and R. L. Aulombard, International Conference on Silicon Carbide and III Nitrides, 1997, Stockholm, 1997.