Edge-emitting semiconductor microlasers with ultrashort-cavity and dry-etched high-reflectivity photonic microstructure mirrors

IEEE Photonics Technology Letters

Volumn 13, Issue 3, 2001, Pages 176-178

  Raffaele, Luigi ^a,b   De La Rue, Richard M ^b   Roberts, John S ^c   Krauss, Thomas F ^d  

^a UNIVERSITY OF PALERMO   (Italy)

^b UNIVERSITY OF GLASGOW   (United Kingdom)

^c UNIVERSITY OF SHEFFIELD   (United Kingdom)

^d UNIVERSITY OF ST ANDREWS   (United Kingdom)

Author keywords

Bragg mirrors; Dry etching; High density opto electronic circuits; Microlaser; Photonic microstructures; Semi conductor laser; Ultrashort cavity

Indexed keywords

CAVITY RESONATORS; DRY ETCHING; LIGHT REFLECTION; MICROOPTICS; MIRRORS; ULTRASHORT PULSES;

EDGE-EMITTING SEMICONDUCTOR MICROLASERS;

SEMICONDUCTOR LASERS;

EID: 0035271454     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.914312     Document Type: Article

References (13)

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5. Edge-emitting lasers with short-period semiconductor/air distributed Bragg reflector mirrors
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8. Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine and chlorine-based reactive-ion etching
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11. Grating-coupled surface-emitting laser with a hyperbolic unstable resonator producing a stable focused output beam