Preventive maintenance measures for: Contamination control

Solid State Technology

Volumn 48, Issue 12, 2005, Pages 53-56

  Li, S N ^a   Shih, H Y ^a,d   Wang, K S ^a,d   Hsieh, K ^b   Chen, Yin Yung ^b,e   Chen, Y Y ^c   Chou, J ^c,e  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b WINBOND ELECTRONICS CORPORATION   (Taiwan)

^c TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^d LOVELACE RESPIRATORY RESEARCH INSTITUTE   (United States)

^e ITRI's CESH ^*

Author keywords

[No Author keywords available]

Indexed keywords

CHAMBER LIDS; CONTAMINATION CONTROL; DOWNSTREAM FORELINES; WAFER QUALITY;

CONTAMINATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROMETERS; PREVENTIVE MAINTENANCE;

SOLID STATE DEVICES;

EID: 29744458021     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

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