Using an extractive fourier transform infrared spectrometer for improving clean room air quality in a semiconductor manufacturing plant

American Industrial Hygiene Association Journal

Volumn 64, Issue 3, 2003, Pages 408-414

  Li, Shou Nan ^a   Chang, Chin Ta ^b   Shih, Hui Ya ^a   Tang, Andy ^b   Li, Alen ^b   Chen, Yin Yung ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b WINBOND ELECTRONICS CORPORATION   (Taiwan)

Author keywords

Cleanroom air quality; Fourier transform infrared (FTIR) spectrometer; Preventive maintenance; Semiconductor

Indexed keywords

FLUORIDE; NITROGEN; OZONE; SILICON TETRAFLUORIDE; UNCLASSIFIED DRUG; WATER;

ABSORPTION SPECTROSCOPY; AIR QUALITY; AMBIENT AIR; ARTICLE; CONCENTRATION (PARAMETERS); INDUSTRY; INFRARED SPECTROSCOPY; MONITORING; ODOR; OZONATION; SEMICONDUCTOR; SPECTRAL SENSITIVITY; SPECTROMETER; WATER SUPPLY; WAVEFORM;

AIR POLLUTION, INDOOR; FLUORIDES; HUMANS; INDUSTRY; ODORS; OZONE; QUALITY CONTROL; SEMICONDUCTORS; SILICON COMPOUNDS; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; TAIWAN; VENTILATION;

EID: 0042734473     PISSN: 15428117     EISSN: None     Source Type: Journal    
DOI: 10.1080/15428110308984835     Document Type: Article

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