Sputtering deposited ternary Zn1-xCdxO crystal films on Si(1 1 1) substrates

Thin Solid Films

Volumn 461, Issue 2, 2004, Pages 250-255

  Ma, D W ^a   Ye, Z Z ^a   Lu, H M ^a   Huang, J Y ^a   Zhao, B H ^a   Zhu, L P ^a   Zhang, H J ^b   He, P M ^b  

^a ZHEJIANG UNIVERSITY   (China)

^b ZHEJIANG UNIVERSITY   (China)

Author keywords

Sputtering; Structural properties; X Ray photoelectron spectroscopy; Zinc oxide

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; OXIDATION; SILICON; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC ALLOYS; ZINC OXIDE;

CRYSTAL FILMS; DIRECT BAND GAP; STRUCTURAL PROPERTIES;

THIN FILMS;

EID: 2942756207     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.085     Document Type: Article

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