Method for correcting the joint error of a laser writer

Optics Express

Volumn 11, Issue 9, 2003, Pages 975-979

  Xie, Yongjun ^a   Lu, Zhenwu ^a   Li, Fengyou ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANALOG TO DIGITAL CONVERSION; DIFFRACTIVE OPTICS; ERROR ANALYSIS; LASER APPLICATIONS; LASER BEAMS; MATHEMATICAL MODELS;

ERROR SCATTERING; LASER WRITERS; MICROFABRICATION;

RAPID PROTOTYPING;

EID: 2942711539     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OE.11.000975     Document Type: Article

References (8)

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6. W. H. Hamaker, G. Burns, and P. Buch, "Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems," in 15th Annual BACUS Symposium on Photomask Technology and Management, G. Shelden and J. Wiley, eds., Proc. SPIE 2621, 319-328 (1995).
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8. J. R. Salgueiro, V. Moreno, and J. Linares, "Model of linewidth for laser writing on a photoresist," Appl. Opt. 41, 895-901 (2002).