Liquid injection MOCVD and ALD studies of "single source" Sr-Nb and Sr-Ta precursors

Materials Research Society Symposium - Proceedings

Volumn 784, Issue , 2003, Pages 97-108

  Potter, Richard J ^a   Marshall, Paul A ^a   Roberts, John L ^a   Jones, Anthony C ^a,b   Chalker, Paul R ^a   Vehkamäki, Marko ^c   Ritala, Mikko ^c   Leskelä, Markku ^c   Williams, Paul A ^b   Davies, Hywel O ^b   Tobin, Neil L ^a   Smith, Lesley M ^b  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b Epichem Oxides and Nitrides   (United Kingdom)

^c UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ALCOHOLS; CAPACITORS; DYNAMIC RANDOM ACCESS STORAGE; FERROELECTRIC DEVICES; FERROELECTRIC THIN FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; STOICHIOMETRY;

ATOMIC LAYER DEPOSITION (ALD); LIQUID INJECTION;

STRONTIUM COMPOUNDS;

EID: 2942685622     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-784-c4.1     Document Type: Conference Paper

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