Dependence of the etching characteristics of SBT thin films on the amount of BCl 3 added to a Cl 3/Ar inductively coupled plasma

Journal of the Korean Physical Society

Volumn 44, Issue 5 I, 2004, Pages 1092-1096

  Yeo, Ji Won ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

ICP; OES; SBT; XPS

Indexed keywords

EID: 2942672475     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (8)

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4. S. B. Kim, C. I. Kim, E. G. Chang and G. Y. Yeom, J. Vac. Sci. Tech. 17, 2156 (1999).
5. Handbook of X-ray Photoelectron Spectroscopy, edited by J. Chastain (Perkin Elmer, 1992).
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7. D. P. Kim and C. I. Kim, J. Korean Phys. Soc. 39, S224 (2001).
8. A. M. Efremov, D. P. Kim and C. I. Kim, J. Korean Phys. Soc. 43, 1042 (2003).