Etching characteristics of SrBi2Ta2O9 thin films in a Cl2/CF4/Ar plasma

Journal of the Korean Physical Society

Volumn 41, Issue 4, 2002, Pages 439-444

  Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

Damage; Etch; ICP; O2 annealing; SBT

Indexed keywords

EID: 0035981408     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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