Interfacial void model for corrosion pit initiation on aluminum

Journal of the Electrochemical Society

Volumn 151, Issue 6, 2004, Pages

  Muthukrishnan, Kamal ^a   Hebert, Kurt R ^a   Makino, Takeshi ^b  

^a Iowa State University   (United States)

^b Chemi Con Materials   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORROSION; CURRENT DENSITY; ETCHING; MATHEMATICAL MODELS; PASSIVATION; SCANNING TUNNELING MICROSCOPY; STAINLESS STEEL;

ANODIC ETCHING; OXIDE FILMS; POSITRON ANNIHILATION;

ALUMINUM;

EID: 2942666222     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1715091     Document Type: Article

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