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Volumn , Issue , 2004, Pages 238-243

Circuit level reliability analysis of Cu interconnects

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATION THEORY; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; COPPER; MATHEMATICAL MODELS; RELIABILITY; TREES (MATHEMATICS);

EID: 2942666104     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISQED.2004.1283680     Document Type: Conference Paper
Times cited : (24)

References (18)
  • 3
    • 0026850769 scopus 로고
    • (Berkeley reliability simulator) BERT: An IC reliability simulator
    • Chenming Hu, (Berkeley Reliability Simulator) BERT: an IC reliability simulator. Microelectronics Journal, 23:97-102, 1992
    • (1992) Microelectronics Journal , vol.23 , pp. 97-102
    • Hu, C.1
  • 6
    • 0041848636 scopus 로고    scopus 로고
    • Layout-specific circuit evaluation in three-dimensional integrated circuits
    • Kluwer Academic Publishers, May-June
    • S. M. Alam, D. E. Troxel, and C. V. Thompson, "Layout-specific Circuit Evaluation in Three-dimensional Integrated Circuits," Analog Integrated Circuits and Signal Processing, An International Journal. Kluwer Academic Publishers, pp 199-206, volume 35, issue 2-3, May-June 2003
    • (2003) Analog Integrated Circuits and Signal Processing, an International Journal , vol.35 , Issue.2-3 , pp. 199-206
    • Alam, S.M.1    Troxel, D.E.2    Thompson, C.V.3
  • 9
    • 0041766644 scopus 로고    scopus 로고
    • Experimental characterization and modeling of the reliability of three-terminal dual-damascene Cu interconnect trees
    • C. L. Gan, C. V. Thompson, K. L. Pey and W. K. Choi "Experimental characterization and modeling of the reliability of three-terminal dual-damascene Cu interconnect trees," Journal of Applied Physics, vol. 94, p. 1222, 2003.
    • (2003) Journal of Applied Physics , vol.94 , pp. 1222
    • Gan, C.L.1    Thompson, C.V.2    Pey, K.L.3    Choi, W.K.4
  • 14
    • 0001598176 scopus 로고    scopus 로고
    • Reliability analysis for encapsulated interconnect lines under dc and pulsed dc current using a continuum electromigration transport model
    • J. J. Clement, "Reliability analysis for encapsulated interconnect lines under dc and pulsed dc current using a continuum electromigration transport model," Journal of Applied Physics, 82, 5991, 1997.
    • (1997) Journal of Applied Physics , vol.82 , pp. 5991
    • Clement, J.J.1
  • 16
    • 0000160317 scopus 로고    scopus 로고
    • Simulation of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects
    • Y. J. Park, V. K. Andleigh, and C. V. Thompson, "Simulation of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects", Journal of Applied Physics, 85, 3546, 1999.
    • (1999) Journal of Applied Physics , vol.85 , pp. 3546
    • Park, Y.J.1    Andleigh, V.K.2    Thompson, C.V.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.