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Volumn 784, Issue , 2003, Pages 29-34

Residual stress effects in ferroelectric thin films

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FERROELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; INTERFACES (MATERIALS); LITHOGRAPHY; PERMITTIVITY; RESIDUAL STRESSES; TENSILE STRESS; THERMAL EFFECTS;

EID: 2942655439     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-784-c3.2     Document Type: Conference Paper
Times cited : (2)

References (18)
  • 17
    • 0031672835 scopus 로고    scopus 로고
    • Ferroelectric thin films
    • G. Teowee, et al., MRS Symposium- Proceedings, 493, Ferroelectric Thin Films 439 (1998).
    • (1998) MRS Symposium- Proceedings , vol.493 , pp. 439
    • Teowee, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.