Thickness dependence of the electrical and electromechanical properties of Pb(Zr,Ti)O3 thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 7 A, 2003, Pages 4392-4398

  Maiwa, Hiroshi ^a   Ichinose, Noboru ^b  

^a SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

^b WASEDA UNIVERSITY   (Japan)

Author keywords

Chemical solution deposition; Domain pinning; Ferroelectric thin films; MEMS; Piezoelectric properties; PZT; SPM; Temperature dependence

Indexed keywords

DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRIC PROPERTIES; FERROELECTRICITY; FILM PREPARATION; MECHANICAL PROPERTIES; NUMERICAL ANALYSIS; SCANNING ELECTRON MICROSCOPY; SPIN COATING; THERMAL EFFECTS; THICKNESS MEASUREMENT; THIN FILMS;

CHEMICAL SOLUTION DEPOSITION; DOMAIN PINNING; ELECTROMECHANICAL PROPERTIES; LEAD ZIRCONATE TITANATE; SCANNING PROBE MICROSCOPY;

LEAD COMPOUNDS;

EID: 0141494631     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4392     Document Type: Article

References (15)

1. A. L. Kholkine, C. Wuetchrich, D. V. Taylor and N. Setter: Rev. Sci. Instrum. 67 (1996) 1935.
2. H. Maiwa, J.-P. Maria, J. A. Christman, S.-H. Kim, S. K. Streiffer and A. I. Kingon: Integr. Ferroelectr. 24 (1998) 139.
3. F. Xu, F. Chu, J. F. Shepard, Jr. and S. T. Mckinstry: Proc. Symp. Mater. Res. Soc. 493 (1998) 427.
4. S. Fujii, I. Kanno, T. Kamada and R. Takayama: Jpn. J. Appl. Phys. 36 (1997) 6065.
5. I. Kanno, S. Fujii, T. Kamada and R. Takayama: Appl. Phys. Lett. 70 (1997) 1378.
6. B. Jaffe, W. R. Cook and H. Jaffe: Piezoelectric Ceramics (R. A. N. Publications, Mineola, NY, 1962).
7. B. A. Tuttle, T. J. Garino, J. A. Voidt, T. J. Headley, D. Dimos and M. O. Eatough: Science and Technology of Electroceramic Thin Films (Kluwer Academic Publishers, Netherlands, 1995) p. 117.
8. A. Kholkin: Ferroelectrics 238 (2000) 799.
9. A. L. Kholkin, E. L. Colla, A. K. Tagantsev, D. V. Taylor and N. Setter: Appl. Phys. Lett. 68 (1996) 2577.
10. N. Hanajima, S. Tsutsumi, T. Yonezawa, K. Hashimoto, R. Nanjyo and M. Yamaguchi: Jpn. J. Appl. Phys. 36 (1997) 6069.
11. H. Maiwa and N. Ichinose: Jpn. J. Appl. Phys. 39 (2000) 5403.
12. X. L. Zhang, Z. X. Chen, L. E. Cross and W. A. Schulze: J. Mater. Sci. 18 (1983) 968.
13. F. Xu, S. T. Mckinstry, W. Ren, B. Xu, Z.-L. Xie and K. J. Hemker: J. Appl. Phys. 89 (2001) 1336.
14. K. Abe and S. Komatsu: J. Appl. Phys. 77 (1995) 6461.
15. B. Noheda, D. E. Cox, G. Shirane, J. A. Gonzalo, L. E. Cross and S.-E. Park: Appl. Phys. Lett. 74 (1999) 2059.