Characteristics of low-k and ultralow-k PECVD deposited SiCOH films

Materials Research Society Symposium - Proceedings

Volumn 716, Issue , 2002, Pages 569-574

  Grill, A ^a   Patel, V ^a   Rodbell, K P ^a   Huang, E ^a   Christiansen, S ^a   Baklanov, M R ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ANNEALING; ATOMIC FORCE MICROSCOPY; COMPOSITION; ORGANIC COMPOUNDS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; REDUCTION; TRANSMISSION ELECTRON MICROSCOPY;

FILM COMPOSITION; ORGANIC PRECURSORS; TETRAMETHYLCYCLOTETRASILOXANE;

SILICON COMPOUNDS;

EID: 0036945513     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-716-b12.3     Document Type: Conference Paper

References (10)

1. 2001 International Technology Roadmap for Semiconductors, Interconnects.
2. A. Grill, L. Perraud, V. Patel, C. Jahnes, and S. Cohen, Mat. Res. Soc. Symp. Proc., 565, 107 (1999)
3. A. Grill, C. Jahnes, V. Patel, and L. Perraud, U.S. 6,147,009 (2000).
4. A. Grill and V. Patel, Appl.Phys.Lett., 79(6) (2001) 803.
5. A. Grill, D. Edelstein and V. Patel, Advanced Metallization Conference 2001, Montreal. Canada, October 9-11, 2001.
6. A. Grill and V. Patel, Mat. Res. Soc. Symp. Proc., 612, D2.9.1 (2000).
7. M.P. Petkov, M.H. Weber, K.G. Lynn and K.P. Rodbell, Applied Physics Letters, 77 (16), 2470 (2000).
8. M. R. Baklanov, K. P. Mogilnikov, V.G. Polovinkin and F.N.Dultsev, J.Vac.Sci.Technol.B, 18B, 1385 (2000).
9. E. Huang, M. Toney, L. B. Lurio, W. Volksen, D. Mecerreyes, P. Brock, C. J. Hawker, J. L. Hedrick, V. Lee, T. Magbitang, R. D. Miller, Applied Physics Letters, Submitted.
10. S. Purushotaman, S. V. Nitta, J. G. Ryan, C. Narayan, M.Krishnan, S. Cohen, S. Gates, S. Whitehair, J. Hedrick, C. Tyberg, S. Greco, K.Rodbell, E. Huang, T.Dalton, R. DellaGuardia, K.Saenger, E. Simonyi, S.-T. Chen, K. Malonne, R. Miller and W. Volksen, IEDM 2001, 529 (2001).