Rod-like β-FeSi2 phase grown on Si (111) substrate

Thin Solid Films

Volumn 461, Issue 1, 2004, Pages 136-140

  Han, Ming ^a   Tanaka, Miyoko ^a   Takeguchi, Masaki ^a   Furuya, Kazuo ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Morphology; Phase transformation; Reactive deposition epitaxy; Semiconducting silicon compounds

Indexed keywords

ANNEALING; DEPOSITION; ELECTRON DIFFRACTION; IRON COMPOUNDS; MORPHOLOGY; SEMICONDUCTING SILICON; SEMICONDUCTOR MATERIALS; SILICA; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM;

LATTICE DISTORTION; METASTABLE; REACTIVE DEPOSITION EPITAXY; TRIANGULAR MORPHOLOGY;

PHASE TRANSITIONS;

EID: 2942644506     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.087     Document Type: Conference Paper

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