Preparation of β-Fesi2 thin film by metal organic chemical vapor deposition using iron-carbonyl and mono-silane

Thin Solid Films

Volumn 461, Issue 1, 2004, Pages 40-43

  Akiyama, Kensuke ^a,b   Ohya, Seishiro ^a   Funakubo, Hiroshi ^b  

^a KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

FeSi2 film; Iron pentacarbonyl; MOCVD; Mono silane

Indexed keywords

CONTAMINATION; DECOMPOSITION; IRON COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MIXING; SILANES; SILICON COMPOUNDS; SURFACE CHEMISTRY;

Β-FESI2 FILMS; IRON-PENTACARBONYL; MONO-SILANES;

THIN FILMS;

EID: 2942642326     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.056     Document Type: Conference Paper

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