Reactive sputtering of magnesium oxide thin film for plasma display panel applications

Thin Solid Films

Volumn 460, Issue 1-2, 2004, Pages 295-299

  Choi, Young Wook ^a   Kim, Jeehyun ^a  

^a Electrophys Grp Korea ERI   (South Korea)

Author keywords

Magnesium oxide; Plasma display panel; Plasma processing and deposition; X ray diffraction

Indexed keywords

ELECTRON EMISSION; HARDENING; MAGNESIA; MATHEMATICAL MODELS; PLASMA DISPLAY DEVICES; SCANNING ELECTRON MICROSCOPY; SPUTTERING; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

ELECTRON EMISSION COEFFICIENT; PLASMA DISPLAY PANEL; PLASMA PROCESSING AND DEPOSITION;

THIN FILMS;

EID: 2942628434     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.066     Document Type: Article

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