Blue-light emission from sputtered Ti:SiO2 films without annealing

Applied Physics Letters

Volumn 84, Issue 19, 2004, Pages 3843-3845

  Hanaizumi, Osamu ^a   Ono, Kazutaka ^a   Ogawa, Yuichi ^a   Matsumoto, Toshiaki ^a   Yoda, Hidehiko ^b   Shiraishi, Kazuo ^b  

^a GUNMA UNIVERSITY   (Japan)

^b UTSUNOMIYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; FUSED SILICA; LIGHT ABSORPTION; LIGHT EMISSION; LUMINESCENCE; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; PRESSURE EFFECTS; REFRACTIVE INDEX; TITANIUM OXIDES;

ABSORPTION COEFFICIENTS; BLUE-LIGHT EMISSION; LINEAR SHAPES; ROOM TEMPERATURE;

THIN FILMS;

EID: 2942608042     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1745113     Document Type: Article

References (13)

1. L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
2. A. G. Cullis, L. T. Canham, and P. D. J. Calcott, J. Appl. Phys. 82, 909 (1997).
3. H. Takagi, H. Ogawa, Y. Yamazaki, A. Ishizaki, and T. Nakagiri, Appl. Phys. Lett. 56, 2379 (1990).
4. Y. Kanemitsu, T. Ogawa, K. Shiraishi, and K. Takeda, Phys. Rev. B 48, 4883 (1993).
5. S. Schuppler, S. L. Friedman, M. A. Marcus, D. L. Adler, Y.-H. Xie, F. M. Ross, T. D. Harris, W. L. Brown, Y. L. Brus, and P. H. Citrin, Phys. Rev. Lett. 72, 2648 (1994).
6. B. T. Sullivan, D. J. Lockwood, H. J. Labbe, and Z.-H. Lu, Appl. Phys. Lett. 69, 3149 (1996).
7. F. Huisken, B. Kohn, and V. Paillard, Appl. Phys. Lett. 74, 3776 (1999).
8. T. Makino, Y. Yarmada, N. Suzuki, T. Yoshida, and S. Onari, J. Appl. Phys. 90, 5075 (2001).
9. K. Sato, M. Iwase, T. Izumi, Y. Show, and H. Morisaki, T. IEE Japan 122-A, 616 (2002) [in Japanese].
10. O. Hanaizumi, K. Ono, Y. Ogawa, T. Koga, Y. Hasegawa, A. Ogihara, and O. Saito, Jpn. J. Appl. Phys., Part 2 41, L1084 (2002).
11. O. Hanaizumi, K. Ono, and Y. Ogawa, Appl. Phys. Lett., 82, 538 (2003).
12. C. F. Song, M. K. Lu, P. Yang, D. Xu, and D. R. Yuan, Thin Solid Films, 413, 155 (2002).
13. S. Kawakami, Electron. Lett., 33, 1260 (1997).