Fabrication of submicrometre 3D periodic structures composed of Si/SiO2

Electronics Letters

Volumn 33, Issue 14, 1997, Pages 1260-1261

  Kawakami, S ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Silicon dioxide; Sputter etching

Indexed keywords

ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA;

SPUTTER ETCHING; SUBMICROMETER PERIODIC STRUCTURES;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0031551272     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19970844     Document Type: Article

References (5)

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