Effect of annealing ambient on the thermal stability of Cu/Zr 42Si9N49/Si contact system

Materials Letters

Volumn 58, Issue 20, 2004, Pages 2510-2513

  Wang, Ying ^a   Zhu, Changchun ^a   Song, Zhongxiao ^a   Wu, Chunyu ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Annealing ambience; Diffusion barrier layer; Multiplayer structure; Thin films

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DIFFUSION; MAGNETRON SPUTTERING; METALLIC FILMS; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ANNEALING AMBIENCE; CONTACT SYSTEMS; DIFFUSION BARRIER LAYERS; MULTILAYER STRUCTURE;

ZIRCONIUM COMPOUNDS;

EID: 2942587174     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.03.009     Document Type: Article

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