Designing of high-resolution photoresists: Use of modern NMR techniques for evaluating lithographic performance

Bulletin of Materials Science

Volumn 27, Issue 3, 2004, Pages 303-316

  Roy, Debmalya ^b   Basu, P K ^b   Raghunathan, P ^c   Eswaran, S V ^a  

^a UNIVERSITY OF DELHI   (India)

^b SOLID STATE PHYSICS LABORATORY   (India)

^c Fluorosis Research & Rural Development Foundation   (India)

Author keywords

Lithographic performance; NMR; Novolac resins; Photoresists

Indexed keywords

CORRELATION METHODS; LITHOGRAPHY; MICROSTRUCTURE; MONOMERS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OPTICAL RESOLVING POWER; PRODUCT DESIGN; RESINS;

LITHOGRAPHIC PERFORMANCE; NOVOLAC RESINS; SUB-MICRON LEVELS;

PHOTORESISTS;

EID: 2942558581     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02708521     Document Type: Article

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