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Volumn 41, Issue 9, 2003, Pages 671-678

Photo-induced cross-linking mechanism in azide-novolac negative photoresists: Molecular level investigation using NMR spectroscopy

Author keywords

13C NMR; 1H NMR; Crosslinking mechanism; Molecular modeling; Negative photoresists; NMR

Indexed keywords

AROMATIC COMPOUNDS; AROMATIZATION; HYDROGEN; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOLYSIS; PHOTORESISTS; REACTION INTERMEDIATES; RESINS;

EID: 0142056262     PISSN: 07491581     EISSN: None     Source Type: Journal    
DOI: 10.1002/mrc.1223     Document Type: Article
Times cited : (8)

References (23)
  • 2
    • 0038489843 scopus 로고    scopus 로고
    • Sheats JR, Smith BW (eds). Marcel Dekker: New York
    • Ueno T. In Microlithography Science and Technology, Sheats JR, Smith BW (eds). Marcel Dekker: New York, 1998; 429.
    • (1998) Microlithography Science and Technology , pp. 429
    • Ueno, T.1
  • 5
    • 0003917975 scopus 로고
    • Scriven EFV (ed.). Academic Press: New York
    • Smith PAS. In Azides and Nitrenes, Scriven EFV (ed.). Academic Press: New York, 1984; 95-203.
    • (1984) Azides and Nitrenes , pp. 95-203
    • Smith, P.A.S.1
  • 17
    • 85165105668 scopus 로고    scopus 로고
    • Patent Application No. PCT/IN/02/00109 (pending)
    • Eswaran SV, Basu PK, Roy D. Patent Application No. PCT/IN/02/00109 (pending).
    • Eswaran, S.V.1    Basu, P.K.2    Roy, D.3
  • 19
    • 85165074208 scopus 로고    scopus 로고
    • PhD Thesis, University of Berlin
    • Voigt Anja. PhD Thesis, University of Berlin, 1999.
    • (1999)
    • Voigt, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.