Development of a molecular dynamics potential for Si-H systems and its application to CVD reaction processes

Surface Science

Volumn 560, Issue 1-3, 2004, Pages 1-11

  Izumi, S ^a   Sato, Y ^b   Hara, S ^a   Sakai, S ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Chemical vapor deposition; Models of surface kinetics; Molecular dynamics; Molecule solid reactions; Silane; Silicon; Surface chemical reaction

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; CHEMICAL VAPOR DEPOSITION; DESORPTION; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; PROBABILITY; STATISTICAL METHODS; SURFACE REACTIONS;

MODELS OF SURFACE KINETICS; MOLECULE-SOLID REACTIONS; SURFACE CHEMICAL REACTIONS; VIBRATION WAVE NUMBER;

SILANES;

EID: 2942544413     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.05.048     Document Type: Article

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