Kinetics of silicon film growth and the deposition phase diagram

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 13-18

  Ferreira, G M ^a   Ferlauto, A S ^a   Chen, Chi ^a   Koval, R J ^a   Pearce, J M ^a   Ross, C ^b   Wronski, C R ^a   Collins, Robert W ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; OPTIMIZATION; PHASE DIAGRAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SPECTROSCOPY; THIN FILMS;

DEPOSITION PHASE DIAGRAM; REAL TIME SPECTROSCOPIC ELLIPSOMETRY (RTSE); SILICON FILM GROWTH;

FILM GROWTH;

EID: 2942536304     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.02.013     Document Type: Conference Paper

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