Stress-induced magnetic anisotropy in Xe-ion-irradiated Ni thin films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 243, Issue 1, 2006, Pages 51-57

  Zhang, Kun ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Film stress; Ion implantation; Magnetic anisotropy; Thin film

Indexed keywords

ION IMPLANTATION; IRRADIATION; NICKEL; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRESS ANALYSIS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; XENON;

BENDING AXIS; FILM STRESS; KERR EFFECT;

MAGNETIC ANISOTROPY;

EID: 29244476087     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.07.241     Document Type: Article

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