Ion-beam-induced magnetic texturing of thin nickel films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161, Issue , 2000, Pages 1016-1021

  Zhang, Kun ^a   Lieb, K P ^a   Schaaf, P ^a   Uhrmacher, M ^a   Felsch, W ^a   Munzenberg, M ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON ENERGY LEVELS; FERROMAGNETISM; ION BEAMS; ION IMPLANTATION; KERR MAGNETOOPTICAL EFFECT; MAGNETIC FIELD EFFECTS; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION; METALLIC FILMS; SEMICONDUCTING SILICON; TEXTURES;

CONVERSION ELECTRON MOSSBAUER SPECTROSCOPY; ION INDUCED MAGNETIC PATTERING; MAGNETIC TEXTURING EFFECTS;

NICKEL;

EID: 0033878259     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00958-1     Document Type: Article

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