Characterization of 'ARE' deposited silicon nitride films and their feasibility as antireflection coating

Surface and Coatings Technology

Volumn 200, Issue 7, 2005, Pages 2058-2064

  Patil, Sheetal J ^a   Mohite, K C ^a   Mandale, A B ^b   Takwale, M G ^a   Gangal, S A ^a  

^a UNIVERSITY OF PUNE   (India)

^b NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

Activated Reactive Evaporation; Antireflection coating; Optical materials and properties; Silicon nitride

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; OPTICAL MATERIALS; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SUBSTRATES; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ACTIVATED REACTIVE EVAPORATION (ARE); DEPOSITED SILICON NITRIDE FILMS; NITROGEN GAS PLASMA; SILICON SUBSTRATES; ULTRAVIOLET-VISIBLE SPECTRA;

ANTIREFLECTION COATINGS;

COATING;

EID: 29244459131     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.07.068     Document Type: Article

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