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Volumn 26, Issue 12, 2005, Pages 888-890

Monolithic integration of an infrared photon detector with a MEMS-based tunable filter

Author keywords

Bragg; Detectors; Infrared (IR); Microelectromechanical system (MEMS); Silicon nitride; Tunable

Indexed keywords

DETECTORS; MIRRORS; PHOTOCONDUCTING DEVICES; SILICON NITRIDE; SPECTRUM ANALYSIS; TUNING;

EID: 29244455323     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2005.859651     Document Type: Article
Times cited : (65)

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    • R. W. Mao, Y. H. Zuo, C. B. Li, B. W. Cheng, X. G. Teng, L. P. Luo, J. Z. Yu, and Q. M. Wang, "Demonstration of low-cost Si-based tunable long-wavelength resonant-cavity-enhanced photodetectors,"Appl. Phys. Lett., vol. 86, no. 3, 2005.
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  • 2
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    • "Miniaturized time-scanning Fourier transform spectrometer based on silicon technology"
    • O. Manzardo, H. P. Herzig, C. R. Marxer, and N. F. de Rooij, "Miniaturized time-scanning Fourier transform spectrometer based on silicon technology," Opt. Lett., vol. 24, no. 23, pp. 1705-1707, 1999.
    • (1999) Opt. Lett. , vol.24 , Issue.23 , pp. 1705-1707
    • Manzardo, O.1    Herzig, H.P.2    Marxer, C.R.3    de Rooij, N.F.4
  • 5
    • 0028484408 scopus 로고
    • "Improved device technology for epitaxial HgCdTe infrared photoconductor arrays"
    • J. F. Siliquini, K. A. Fynn, B. D. Nener, L. Faraone, and R. H. Hartley, "Improved device technology for epitaxial HgCdTe infrared photoconductor arrays," Semicond. Sci. Technol., vol. 9, pp. 1515-1522, 1994.
    • (1994) Semicond. Sci. Technol. , vol.9 , pp. 1515-1522
    • Siliquini, J.F.1    Fynn, K.A.2    Nener, B.D.3    Faraone, L.4    Hartley, R.H.5
  • 7
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    • "Tunable fabry-perot cavities fabricated from PECVD silicon nitride employing zinc sulphide as the sacrificial layer"
    • K. J. Winchester and J. M. Dell, "Tunable fabry-perot cavities fabricated from PECVD silicon nitride employing zinc sulphide as the sacrificial layer," J. Micromech. Microeng., vol. 11, pp. 589-594, 2001.
    • (2001) J. Micromech. Microeng. , vol.11 , pp. 589-594
    • Winchester, K.J.1    Dell, J.M.2
  • 8
    • 0002543402 scopus 로고
    • "Stress in films of silicon monoxide"
    • A. E. Hill and G. R. Hoffman, "Stress in films of silicon monoxide," Brit. J. Appl. Phys., vol. 18, pp. 13-22, 1967.
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    • Hill, A.E.1    Hoffman, G.R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.