Plasmonic properties of film over nanowell surfaces fabricated by nanosphere lithography

Journal of Physical Chemistry B

Volumn 109, Issue 47, 2005, Pages 22351-22358

  Hicks, Erin M ^a   Zhang, Xiaoyu ^a   Zou, Shengli ^a   Lyandres, Olga ^b   Spears, Kenneth G ^a   Schatz, George C ^a   Van Duyne, Richard P ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

^b Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOSPHER LITHOGRAPHY; NANOWELL SURFACES; PLASMONIC PROPERTIES;

ATOMIC FORCE MICROSCOPY; DIELECTRIC PROPERTIES; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; REACTIVE ION ETCHING; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THIN FILMS;

PLASMA APPLICATIONS;

NANOMATERIAL; SILICON;

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; METHODOLOGY; PARTICLE SIZE; SCANNING ELECTRON MICROSCOPY; SENSITIVITY AND SPECIFICITY; SURFACE PROPERTY;

MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; PARTICLE SIZE; SENSITIVITY AND SPECIFICITY; SILICON; SURFACE PROPERTIES;

EID: 29144455813     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0545400     Document Type: Article

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