Multi-axis retarder arrays by masked oblique deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 4, 2005, Pages 1398-1404

  Arnold, M D ^a   Hodgkinson, I J ^a   Wu, Q H ^a   Blaikie, R J ^b  

^a UNIVERSITY OF OTAGO   (New Zealand)

^b UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; LATTICE CONSTANTS; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; POLARIMETERS;

COATING THICKNESS; RETARDATION; STOKES POLARIMETRY;

DEPOSITION;

EID: 29144449456     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1993618     Document Type: Article

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